Advanced Micro and Nanoscale Material Processing and Analysis Techniques
Fizikus mérnök BSc
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Dr. Olga Krafcsik, associate professor, PhD
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This course introduces novel micro and nanoscale material processing and analysis techniques to students. Definition of microtechnology, nanotechnology and molecular nanotechnology, their comparison and interrelation. Technological conditions. Micro- and nanophysics. Thin layer deposition methods: physical (vacuum evaporation, laser ablation evaporation, molecular beam epitaxy, sputtering). Doping (diffusion, ion implantation). Lithography (photo, X-ray, electron beam, ion beam). Layer removing technologies: wet (chemical) etching, dry (plasma, ion beam) etching. Layer characterisation methods: X-ray diffraction, transmission electron microscopy, scanning electron microscopy, secondary ion mass spectrometry, X-ray photoelectron spectroscopy, Auger electron microscopy, scanning tunneling microscopy, atomic force microscopy. Conventional electronic devices: bipolar transistor, field effect transistor. Thick layer technology: screen printing, burning, thick layer pastes. Nanometer devices: single electron devices, resonant tunnel effect devices, micro-electromechanical systems, sensors, image detectors, displays.
Hans H. Gatzen, Volker Saile, Jürg Leuthold, Micro and Nano Fabrication (Springer, 2015) e-ISBN: 978-3-662-44395-8 Harmut Frey, Hamid R. Khan, Handbook of Thin Film Technology (Springer, 2015) ISBN 978-3-642-05430-3 Bharat Bhushan, Handbook of Nanotechnology, 4th Edition (Springer, 2017) e-ISBN: 978-3-662-54357-3 Nanoelectronics and information technology, Wiley-VCH, 2003
List of competences:
Please find the detailed list, as quoted from the Hungarian training and outcome requirements of the Physicist Engineer program, in the Hungarian version of the course description.